[Code of Federal Regulations]

[Title 40, Volume 13]

[Revised as of July 1, 2005]

From the U.S. Government Printing Office via GPO Access

[CITE: 40CFR63.7182]



[Page 62-63]

 

                   TITLE 40--PROTECTION OF ENVIRONMENT

 

         CHAPTER I--ENVIRONMENTAL PROTECTION AGENCY (CONTINUED)

 

PART 63_NATIONAL EMISSION STANDARDS FOR HAZARDOUS AIR POLLUTANTS FOR 

SOURCE CATEGORIES--Table of Contents

 

 Subpart BBBBB_National Emission Standards for Hazardous Air Pollutants 

                     for Semiconductor Manufacturing

 

Sec. 63.7182  What parts of my facility does this subpart cover?



    (a) This subpart applies to each new, reconstructed, or existing 

affected source that you own or operate that manufactures 

semiconductors.

    (b) An affected source subject to this subpart is the collection of 

all semiconductor manufacturing process units used to manufacture p-type 

and n-type semiconductors and active solid-state devices from a wafer 

substrate, including research and development activities integrated into 

a semiconductor



[[Page 63]]



manufacturing process unit. A semiconductor manufacturing process unit 

includes the equipment assembled and connected by ductwork or hard-

piping including furnaces and associated unit operations; associated wet 

and dry work benches; associated recovery devices; feed, intermediate, 

and product storage tanks; product transfer racks and connected ducts 

and piping; pumps, compressors, agitators, pressure-relief devices, 

sampling connecting systems, open-ended valves or lines, valves, 

connectors, and instrumentation systems; and control devices.

    (c) Your affected source is a new affected source if you commence 

construction of the affected source after May 8, 2002, and you meet the 

applicability criteria in Sec. 63.7181 at the time you commence 

construction.

    (d) Your affected source is a reconstructed affected source if you 

meet the criteria for ``reconstruction,'' as defined in Sec. 63.2.

    (e) Your source is an existing affected source if it is not a new or 

reconstructed affected source.